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Brand Name : ZMSH
Payment Terms : T/T
Delivery Time : 2-4weeks
Polytype : 4H
Surface orientation error : 4°toward<11-20>±0.5º
Diameter : 157±0.5mm
Thickness : 500±50μm
Primary OF Flat : 18±2.0mm
2st OF Flat : 8±2.0mm
Silicon Carbide Seed wafer type 4H Dia 157±0.5mm thickness 500±50um monocrystall area >153mm
4H Silicon Carbide Seed's abstract
In the field of silicon carbide (SiC) crystal growth, production-grade SiC seed wafers are essential for creating high-performance crystals. These wafers act as the starting material for single-crystal SiC growth, used in high-temperature, high-power electronic devices. Production-grade wafers must meet strict criteria for surface uniformity, purity, and defect levels to support the growth of defect-minimized SiC crystals. The use of seed wafers ensures consistent crystal structures and is crucial in power semiconductor devices like diodes and transistors. High-quality seed wafers contribute to the efficiency and durability of SiC components in various industries.
4H Silicon Carbide Seed's photo
4H Silicon Carbide Seed's properties
SiC seed wafers are specifically designed to withstand the high temperatures required for SiC crysta growth. Processes
such as physical vapor transport (PVT) rely on temperatures exceeding 2000°C, and the seed wafer must remain stable under these extreme conditions. Production-grade wafers are engineered to have exceptional thermal stability, which allows for consistent and reliable crystal growth. This temperature resilience is crucial for growing large, defect-free SiC crystals that are used in high-power and high-temperature applications, such as electric vehicles, aerospace systems, and renewable energy technologies. Wafers optimized for high-temperature growth help reduce defects like dislocations and micropipes, ensuring a higher yield of usable SiC material.
4H Silicon Carbide Seed's applications
Specification
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Silicon Carbide Seed Wafer Type 4H Dia 157±0.5mm Thickness 500±50um Monocrystall Area >153mm Images |